Microlithographic Mask Development (MMD)

reportActive / Technical Report | Accession Number: ADA334393 | Open PDF

Abstract:

The primary goal throughout the Option 2 contract period was to eliminate the gold absorber process and implement a refractory metal process. With the initial transition completed, in which all mask patterning processes have been implemented within the MMD, the focus is currently on implementing all substrate fabrication steps within the MMD as well. This has resulted in the purchase and installation of some major equipment. In addition, our goal of developing processes for 130nm and below continues, and has also resulted in major equipment purchases and process changes. At the same time, we have been working on several important product demonstration masks for various customers.

Author(s):
No Author(s) Identified
Author Organization(s):
LOCKHEED MARTIN FEDERAL SYSTEMS MCLEAN VA
Pagination:
0142

Security Markings

DOCUMENT & CONTEXTUAL SUMMARY

Distribution:
Approved For Public Release

RECORD

Collection: TR
Identifying Numbers
Contract/Grant Number(s):
N00019-94-C-0035
Monitor Series:
NAVAIR***
 Subject Terms
Joint Capability Areas:
JCA_5_Command and Control; JCA_5.3_Planning; JCA_4.6_Engineering; JCA_4.6.1_General Engineering; JCA_5.3.4_Develop Courses of Action; JCA_5.3.5_Analyze Courses of Action; JCA_5.5_Direct; JCA_5.3.3_Develop Strategy; JCA_5.6.3_Assess Achievement of Objectives; JCA_5.6_Monitor; JCA_5.5.1_Communicate Intent and Guidance; JCA_5.5.2_Task; JCA_4.3_Maintain; JCA_1.2.7_Experimentation; JCA_1.1_Force Management; JCA_1_Force Support; JCA_4.5_Operational Contract Support; JCA_4.5.2_Contractor Management; JCA_1.3.2_Personnel Management; JCA_1.2.3_Educating; JCA_1.2.5_Lessons Learned
Modernization Areas:
Microelectronics
Communities of Interest:
Advanced Electronics
Descriptor(s):
*LITHOGRAPHY, *REFRACTORY METALS, *MASKS, VALIDATION, ELECTRONIC EQUIPMENT, FABRICATION, SUBSTRATES, ETCHING, COATINGS, PROCUREMENT, CIRCUITS, GOLD, ELIMINATION, SILICON CARBIDES
Field(s)/Group(s):
Inorganic Chemistry, Coatings, Colorants and Finishes
Keyword(s):
GOLD ABSORBER PROCESS, MMD(MICROLITHOGRAPHIC MASK DEVELOPMENT), *MICROLITHOGRAPHIC MASK DEVELOPMENT, NIGHTEAGLES, LEICA LMS 2020 IMAGE, SUSS AUTOMATED RESIST COATING, RESIST COATING, NIGHTHAWKS, SPUTTERED FILMS ENDEAVOR 8600, *REFRACTORY MASKS, FLUOROWARE BOATS, MASK BOXES, MEMBRANE MATERIALS
Report Date:
1997 Dec 22
Creation Date:
1998 Jan 28