Orientation of Crystalline Overlayers on Amorphous Substrates by Artificially Produced Surface Relief Structures

A new method of orienting crystalline anisotropic overlayers on an amorphous substrate by surface relief structures on the substrate has been analyzed and demonstrated. New submicrometer fabrication techniques has to be developed in order to demonstrate the orientation effect. These techniques may have broad application in the field of microelectronics and integrated optics as well as in the work presented here. It is believed that the models and demonstrations of overlayer orientation presented here are but a first step in what will be an exciting new field of investigation. In essence, a new degree of freedom has been introduced in the science and technology of surfaces and thin- film growth.