Comparison of CPM, PDS and Optical Transmittance of Amorphous Carbon Nitride Films Made by a Nitrogen Radical Sputter Method

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Abstract:

Amorphous carbon nitride films a-CNx, deposited in our laboratory by a radical sputter method, show high photosensitivity Ps, where Ps is the ratio of photoconductivity sigmap and dark-electrical conductivity omegad-Cid A-CNx made a layer-by-layer method, LLa-CNx, has the highest photosensitivity in our various preparation conditions. The photoconductivity in a- CNx and LLa-CNx shows dependence on photon energy in the range 2 eV to 6.2 eV. The constant photocurrent method CPM, photothermal deflection spectroscopy PDS and optical transmittance spectra are used to obtain the information in the optical energy band gap and defect states, A-CNx and LLa-CNx are good photoconductors especially at energy higher than 3 eV. Therefore it is not difficult to obtain CPM spectra in the high photon energy region. CPM spectra are obtained by dc- and ac- measurements. The value of the absorption coefficient a spectra obtained by dc-CPM is larger than that of ac-CPM, which increases with increasing frequency of the measurement. In this paper, CPM data is used to discuss a model of density of states DOS of a-CNx by comparison with PDS and optical transmittance spectra.

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