Photoluminescence Mapping: New Technique to Characterize Materials and Structures for Fabrication of Photonic Devices,

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Abstract:

Since the fabrication of photonic devices is a complex and expensive process it is highly desirable to characterize both starting material and device structures after each step of technological Process. The ideal candidate which meets the production and research criteria is photoluminescence mapping technique. In this paper we describe apparatus for measuring photoluminescence over the entire wafer and discuss a number of applications of this technique.

Author(s):
Bugajski, Maciej ; Ornoch, Jacek
Author Organization(s):
INSTITUTE OF ELECTRON TECHNOLOGY WARSAW (POLAND)
Supplementary Note:
This article is from 'Advanced Processing and Characterization Technologies. Fabrication and Characterization of Semiconductor Optoelectronic Devices and Integrated Circuits Held in Clearwater, Florida on 8-10 May 1991. American Vacuum Society Series 10,'AD-A254 162, p38-41.
Pagination:
0004

Security Markings

DOCUMENT & CONTEXTUAL SUMMARY

Distribution:
Approved For Public Release

RECORD

Collection: TR
Subject Terms
Communities of Interest:
Advanced Electronics
Descriptor(s):
*PHOTOLUMINESCENCE, *MAPPING, *SEMICONDUCTOR DEVICES, FABRICATION, MAPPING, MATERIALS, PHOTONICS, PRODUCTION, STRUCTURES, WAFERS
Field(s)/Group(s):
Electrooptical and Optoelectronic Devices, Solid State Physics
Keyword(s):
Component Reports
Report Date:
1992 Jul 01