Computer Generated Hologram Mask.

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Abstract:

A method of making hologram masks for arbitrary shapes is disclosed. The masks are generated by calculating point by point the surface contour of the hologram desired for the incoming wavefront and the desired wavefront. Calculation permits a mass image to be generated which can be photo-reduced to a desired size. The mask permits holograms to correct aberrated wavefronts for any arbitrary distorting objects desired. The use of thin holograms permits the hologram to avoid wavelength and angle of incidence limitations. Author

Author(s):
Holoway, Harry W.
Author Organization(s):
DEPARTMENT OF THE NAVY WASHINGTON DC
Descriptive Note:
Patent Application,
Pagination:
0012

Security Markings

DOCUMENT & CONTEXTUAL SUMMARY

Distribution:
Approved For Public Release
Distribution Statement:
Availability: This Government-owned Invention Available For U.s. Licensing And, Possibly, For Foreign Licensing. Copy Of Application Available Ntis.

RECORD

Collection: TR
Identifying Numbers
Report Number(s):
PAT-APPL-226 980
 Subject Terms
Communities of Interest:
No COI(s) Identified
Descriptor(s):
*Patent applications, *Holography, *Masks, *Computer aided design, Contours, Points(Mathematics), Grids(Coordinates), Surfaces, Wavefronts, Thin films, Aerodynamic characteristics, Distortion, Vector analysis
Field(s)/Group(s):
Holography
Report Date:
1981 Jan 21