Studies into sub 100 nm Resists for Proton Beam Writing

Project AOARD 06-4004 has resulted in 5 scientific publications in the areas of resist investigation for proton beam writing, optimized proton beam focusing through new methods of detecting secondary electrons, and theoretical calculations that show the absence of proximity effects in proton beam writing. The projects Main achievement is a paper in Nano Letters in which HSQ is introduced as a superior resist for proton beam writing down to the 20 nm level. In 2006-2007, the authors also have published three papers related to their AOARD 05-4037 project one focused on the fabrication of microlenses, a second one on the optimized fabrication of resolution standards for proton beam writing, and a third paper that discusses the use of proton beam writing for the fabrication of metal stencil masks for LIGA X-ray fabrication.