High Resolution Diagnostics for Pulse Shortening in HPM Sources

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Abstract:

The aim of the research conducted using the equipment acquired under this DURIP Grant is to develop the plasma depositionimplantation process for coating barium, strontium and calcium oxides on nickel substrates and to perform detailed surface analysis of the resultant materials as well as complete cathode lifetime and performance studies. Plasma depositionimplantation of the oxide layer directly on the cathode surface will eliminate the major sources of cathode poisoning.

Author(s):
Luhmann, N. C., Jr
Author Organization(s):
CALIFORNIA UNIV DAVIS DEPT OF APPLIED SCIENCE
Descriptive Note:
Final rept. 1 Aug 96-31 Jul 98
Pagination:
0013

Security Markings

DOCUMENT & CONTEXTUAL SUMMARY

Distribution:
Approved For Public Release

RECORD

Collection: TR
Identifying Numbers
Report Number(s):
AFRL-SR-BL-TR-98-0684
Contract/Grant Number(s):
F49620-96-1-0380
Task Number(s):
US
Project Number(s):
3484
Monitor Series:
TR-98-0684, AFOSR
 Subject Terms
Joint Capability Areas:
JCA_5.3_Planning; JCA_5_Command and Control; JCA_1.2.3_Educating
Modernization Areas:
Directed Energy
Communities of Interest:
Advanced Electronics
Descriptor(s):
*METAL COATINGS, *OXIDE CATHODES, SURFACE ANALYSIS, MICROWAVES, SUBSTRATES, ION IMPLANTATION, NICKEL, PLASMA SPRAYING
Field(s)/Group(s):
Electrical and Electronic Equipment, Coatings, Colorants and Finishes, Plasma Physics and Magnetohydrodynamics
Keyword(s):
*PLASMA DEPOSITION, HPM(HIGH POWER MICROWAVES), PULSE SHORTENING, PE61103D, WUAFOSR3484US
Report Date:
1998 Jul 31
Creation Date:
1998 Nov 18