MBE Growth of GaInAsSb.

reportActive / Technical Report | Accession Number: ADA328229 | Open PDF

Abstract:

Optimum growth conditions for high quality growth of GaAs, GaSb, InSb and GaInAsSb epilayers by Molecular Beam Epitaxy MBE on GaAs substrates and homoepitaxial growth of InSb have been determined. A new procedure for expeditious removal of oxide desorption from InSb has been found. InSb epilayers grown on InSb substrate after the above oxide desorption exhibited x-ray rocking curve with full width half maxima of 13 arc-sec, reproducibly. Efforts of our research have also been devoted to aspects of material characterization. Low temperature photoreflectance PR of Te- doped GaSb has been used to determine the transition energy of spin-orbit split component of the fundamental band gap. Temperature dependence of this transition energy has been determined. These are the first PR reports on GaSb. Theoretical calculations of a novel InAsSbInT1Sb superlattice structure lattice-matched to InSb indicated a type I band alignment, with optical band gap in the long-wavelength region.

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