Final Technical Report for JSEP Fellowship Executive Summary (Gross-Sectional Scanning/Tunneling Microscopy Investigations of Cleaned III-V Heterostructures).

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Abstract:

Fabrication technology and device sizes have reached the point where fluctuations on the atomic level may affect device performance. The need for a tool to characterize these structures has been satisfied by cross-sectional scanning tunneling microscopy XSTM. This summary and attached thesis detail the development and application of XSTM to III-V heterostructures accomplished during the term of the JSEP Fellowship of Warren Wu. An ultra-high vacuum UHV system dedicated to XSTM was specifically designed and constructed as part of this work. Reported for the first time were XSTM cross-sections of self-assembled InAs quantum dots, XSTM cross-sections of quantum wires created by the strain-induced lateral-layer ordering SILO process as well as the first XSTM data on working device structures. These working device structures include resonant tunneling diode RTD structures, a quantum well infrared photodetector structure and a modulation doped field effect transistor MODFET structure. XSTM has proved useful in characterizing interface roughness, alloy fluctuations and individual atomic positions.

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