High Vacuum Evaporation System.

The primary objective of the electron beam evaporator is to apply high quality optical coatings for lasers operating in the midinfrared region 2-5 micron band, as well as lasers emitting in the range of 0.7 - 1.0 micron wavelength. The electron beam evaporator is used to compare the performance of midinfrared laser diodes with different schemes of optical coating on the laser facets. The use of optical coatings on lasers facets is to show the improvement in high power performance with HR high reflective LR low reflective coating, and high temperature performance with HR coatings for the midinfrared lasers as well as lasers emitting in the range of 0.7 - 1.0 micron. It has become mandatory to use high quality optical coatings for further improving the performance of 3.2 um InAsSbInAs lasers. Three schemes of facet coatings are studied LR coating on front, HR on back, and asymetric coating of LRHR. The ebeam system is also used for the application of Sb-based infrared photodetectors.