Computer-Controlled Ion Beam Sputter-Deposition of Superconducting Oxide Films

The system developed can be used to produce multicomponent andor multilayered structures. Computer-controlled growth of multicomponent materials can be accomplished by sequentially sputtering from elemental targets. Layered structures can be obtained by sequentially sputtering from different multicomponent targets. Sputtering targets are mounted on a motor-driven rotating holder for sequential, in situ positioning in front of the ion beam. The thickness of each individual material layer is monitored by a quartz crystal resonator. The computer program uses feedback control from the quartz crystal monitor to turn the ion beam on and off, and to position the appropriate target in front of the ion beam. This system can be utilized in three basic configurations with multiple elemental or single cation targets, for growing multicomponent oxide films multiple cations of any chosen composition, e.g. Y, Cu, and BaF targets for YBa2Cu3O7-sigma film growth with multiple elemental or compound targets, for growing multiple film layers, such as YBa2Cu3O7-sigma MgO layers.