X-Ray Photoelectron Spectroscopy Study on the Double Layer at an Al203-Al Interface

reportActive / Technical Report | Accession Number: ADA246454 | Open PDF

Abstract:

Upon oxidation of a clean Al Aluminum surface, and electrical double layer EDL is formed at the aluminum-aluminum oxide interface. This EDL is investigated using X-ray Photoelectron Spectroscopy data available in the literature. The EDL strength, measured as a potential difference across the EDL, depends on the Al surface and the oxidation process. The polarity of the EDL is however invariably the same the Al2o3 side of the Al-Al203 interface is always positively charged. The reduction of the Al work function upon oxidation is attributed to this EDL. The asymmetry in the potential barrier shape formed in Al-Al2o3-Al sandwiches is also attributed to a strong EDL at the electron-film interface and a weaker EDL at the interface between the counter electrode and the film. Author

Author(s):
Ramaker, David E. ; Sambe, Hideo
Author Organization(s):
GEORGE WASHINGTON UNIV WASHINGTON DC DEPT OF CHEMISTRY
Descriptive Note:
Technical rept.,
Supplementary Note:
DOI: 10.21236/ADA246454
Pagination:
0013

Security Markings

DOCUMENT & CONTEXTUAL SUMMARY

Distribution:
Approved For Public Release
Distribution Statement:
Approved For Public Release; Distribution Is Unlimited.

RECORD

Collection: TR
Identifying Numbers
Report Number(s):
TR-56
Contract/Grant Number(s):
N00014-91-J-1896
Monitor Series:
ONR
 Subject Terms
Modernization Areas:
Fully Networked C3
Communities of Interest:
Materials and Manufacturing Processes
Descriptor(s):
*LAYERS, SURFACES, ASYMMETRY, ELECTRIC DOUBLE LAYER, X RAY PHOTOELECTRON SPECTROSCOPY, ALUMINUM, BARRIERS, WORK FUNCTIONS, SHAPE, OXIDATION
Field(s)/Group(s):
Inorganic Chemistry, Atomic and Molecular Physics and Spectroscopy
Keyword(s):
*X RAY PHOTOELECTRON SPECTROSCOPY, *ELECTRIC DOUBLE LAYER, *ALUMINUM OXIDE, *ALUMINUM, *INTERFACES, ANALYTICAL CHEMISTRY, OXIDATION
Report Date:
1992 Jan 01