Polycrystalline Diamond Junction Field Effect Transistors (JFETS)

reportActive / Technical Report | Accession Number: ADA223784 | Open PDF

Abstract:

The overall objective of this work is to develop a diamond junction field effect transistor JFET technology. The JFET transistor design is an approach that takes advantage of diamonds large bandgap and utilizes this property to help overcome the lack of shallow dopants. The overall approach is to develop a diamond JFET technology through optimization of junction properties that can utilize near degenerate channel boron doping. The high doping levels are necessary to reduce the boron dopant activation energy. The primary approach is to control the built in junction voltage through nitrogen doping, control junction edge leakage with a passivation technology based on selective oxidation and heavily dope the channel with boron. Keywords Diamond, Transistors, JFET, Doping, Epitaxy, Diodes, Fabrication, Nitrogen, Oxygen, Boron, Polycrystalline, Crystallography, Physics.

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