Gas Phase Decomposition of an Organometallic Chemical Vapor Decomposition Precursor to A1N: (Al(CH3)2NH2)3

reportActive / Technical Report | Accession Number: ADA218714 | Open PDF

Abstract:

A novel technique for probing chemical vapor deposition reaction mechanisms is presented. A conventional hot-wall Pyrex reactor is coupled to a molecular beam apparatus. Preliminary results of the decomposition of an organmetallic precursor Aluminum Nitride, AlCH32NH23, indicate a decomposition temperature between 200 and 270 C. The mass spectrum of the precursor at 100 C provides evidence for the existence of a trimer-dimer equilibrium of the precursor at this temperature. Keywords Methylamides Reprints.

Author(s):
Amato, Carmela C. ; Hudson, John B. ; Interrante, Leonard V.
Author Organization(s):
RENSSELAER POLYTECHNIC INST TROY NY DEPT OF CHEMISTRY
Descriptive Note:
Technical rept.
Pagination:
0008

Security Markings

DOCUMENT & CONTEXTUAL SUMMARY

Distribution:
Approved For Public Release
Distribution Statement:
Approved For Public Release; Distribution Is Unlimited.

RECORD

Collection: TR
Identifying Numbers
Report Number(s):
TR-7
Contract/Grant Number(s):
N00014-85-K-0632
Monitor Series:
ONR
 Subject Terms
Joint Capability Areas:
JCA_6.3.3_Spectrum Management; JCA_6_Net Centric; JCA_6.3_Net Management; JCA_3.2_Engagement; JCA_3_Force Application
Modernization Areas:
Microelectronics
Communities of Interest:
No COI(s) Identified
Descriptor(s):
*ALUMINUM COMPOUNDS, *PYROLYSIS, *VAPOR DEPOSITION, *AMIDES, *NITRIDES, *METHYL RADICALS, DECOMPOSITION, DIMERS, MOLECULAR BEAMS, VAPOR PHASES, ORGANOMETALLIC COMPOUNDS, PRECURSORS, MASS SPECTRA, REPRINTS, TEMPERATURE
Field(s)/Group(s):
Industrial Chemistry and Chemical Processing, Organic Chemistry, Physical Chemistry
Keyword(s):
*ALUMINUM METHYLAMIDES, *ALUMINUM NITRIDE, TRIMERS
Report Date:
1990 Jan 15