Depth Profiles and Bulk Analysis of Semiconductor Materials Using ICP mass Spectroscopy with Electrothermal Atomization

reportActive / Technical Report | Accession Number: ADA206974 | Open PDF

Abstract:

The purpose of the contract was to build the equipment necessary to show technical feasibility of a Demand Modulated Electrothermal Atomization System. This system was thought to have advantages over current technology as follows 1 Prevents excessive analyte concentrations in the plasma giving the analyst control over matrix suppression effects. 2 Allows the analyst to control atomization rates and avoid buildup of deposits in the throat of the sample cone opening. 3 Allows the analyst to work in the optimum counting range for isotropic ratio work regardless of concentration variations. 4 Allows the data to be taken over the temperature dimension, thus resolving isobaric interferences as well as improving the signal to noise ratio resulting in improved detection limits across the entire mass range.

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