Equipment for an Advanced Electron Beam Lithography System.

reportActive / Technical Report | Accession Number: ADA192956 | Open PDF

Abstract:

Equipment has been purchased under this grant to develop and build a research electron beam lithography EBL system at Stony Brook for the support of research projects on superconducting electronics. The system is based on an Array scanning electron microscope SEM which has been modified to accept a laser interferometer to monitor stage position. High precision nonmagnetic stages have been added, and interface electronics have been designed and built to permit control of the beam position and beam blanking by an external computer. The completed system is designed to write over a four inch wafer with a resolution of 30nm and a positional accuracy of 100nm.

Author(s):
Lukens, James
Author Organization(s):
STATE UNIV OF NEW YORK AT STONY BROOK DEPT OF PHYSICS
Descriptive Note:
Final rept. 13 Jul 86-14 Jul 87,
Pagination:
0004

Security Markings

DOCUMENT & CONTEXTUAL SUMMARY

Distribution:
Approved For Public Release

RECORD

Collection: TR
Identifying Numbers
Report Number(s):
AFOSR-TR-88-0306
Contract/Grant Number(s):
AFOSR-86-0253
Task Number(s):
A3
Project Number(s):
2917
Monitor Series:
TR-88-0306
 Subject Terms
Modernization Areas:
Microelectronics
Communities of Interest:
Advanced Electronics
Descriptor(s):
*ELECTRON BEAMS, *ELECTRONIC SCANNERS, *LITHOGRAPHY, BEAM STEERING, COMPUTERS, ELECTRON MICROSCOPES, ELECTRONIC EQUIPMENT, ELECTRONICS, INTERFACES, MAGNETIC PROPERTIES, OPTICAL INTERFEROMETERS, POSITION(LOCATION), PRECISION, SUPERCONDUCTIVITY, CONTROL SYSTEMS, LASER APPLICATIONS, ELECTRONIC EQUIPMENT
Field(s)/Group(s):
Printing and Graphic Arts, Electrical and Electronic Equipment, Manufacturing and Industrial Engineering and Control of Production Systems
Keyword(s):
Electron beam lithography, WUAFOSR2917A3, PE61102F
Report Date:
1987 Jul 14