Ion Implantation Manufacturing Technology Project.

reportActive / Technical Report | Accession Number: ADA190487 | Open PDF

Abstract:

The objective of the NRL MANTECH Program was to design, build, and operate a high-throughput ion implantation facility. This facility is to be used to demonstrate the transfer of implantation technology to industrial pilot production conditions. The program consisted of three phases, each intended to involve one year of effort. The first involved design of a vacuum end station with compatible high-throughput workpiece-handling fixtures. Phase 2 consisted of fabrication of this hardware, together with development tests to define implantation conditions for WC tooling. The last phase was to merge a government-funded implanter with the Spire-developed hardware and operate the system as a pilot production facility for the implantation of various Navy bearings for corrosion resistance. This final report covers all phases of the program, including beam system design, target manipulation, system performance, and cost analyses based on actualfuture design concepts.

Author(s):
No Author(s) Identified
Author Organization(s):
SPIRE CORP BEDFORD MA
Descriptive Note:
Final rept.
Supplementary Note:
DOI: 10.21236/ADA190487
Pagination:
0088

Security Markings

DOCUMENT & CONTEXTUAL SUMMARY

Distribution:
Approved For Public Release

RECORD

Collection: TR
Identifying Numbers
Report Number(s):
SPIRE-FR-10089, SPIRE-FR-10097
Contract/Grant Number(s):
N00014-83-C-2221, N00014-85-C-2551
Monitor Series:
574432
 Subject Terms
Joint Capability Areas:
JCA_4.7.2_Installation Services; JCA_4.7_Base and Installations Support; JCA_JCA_4.1.2_Sustain the Force; JCA_4.1_Deployment and Distribution; JCA_5_Command and Control; JCA_5.3_Planning; JCA_6_Net Centric; JCA_1_Force Support; JCA_6.4.1_Secure Information Exchange; JCA_1.2_Force Preparation; JCA_1.2.6_Concepts; JCA_4.3_Maintain; JCA_6.3.3_Spectrum Management; JCA_3.2_Engagement; JCA_3_Force Application; JCA_4.6_Engineering; JCA_6.4_Information Assurance; JCA_3.2.1_Kinetic Means; JCA_6.3_Net Management
Modernization Areas:
Microelectronics
Communities of Interest:
Advanced Electronics
Descriptor(s):
*INDUSTRIAL PRODUCTION, *ION IMPLANTATION, BEARINGS, CORROSION RESISTANCE, COST ANALYSIS, PILOT PLANTS, PRODUCTION, ION BEAMS, MASS SPECTROSCOPY, TUNGSTEN CARBIDES, MANUFACTURING
Field(s)/Group(s):
Manufacturing and Industrial Engineering and Control of Production Systems
Report Date:
1987 Jan 01