Ion Plating: Fundamental Processing Studies and Synthesis of High Performance Coatings.

Ion plating is a physical vapor deposition process which uses a plasma to modify the microstructuremicrochemistry of thin film coatings. This research has directly shown that processing variables such as plasma energydensity substrate temperature deposition rate and substrate surface chemistry directly effect the deposited film microstructure and chemistry. This processing technique allows mechanically strongchemically graded interface layers to be produced between dissimilar material. Film adhesion with this process is correspondingly excellent. This process was used to produce corrosion and wear resistant hard coatings.