Investigation of the Transverse-Discharge Copper-Vapor Laser.
Abstract:
A transverse-discharge copper-vapor laser has been developed using a fast flat-plate Blumlein pulse forming circuit. A specific laser energy density of 50 micor JCC has been achieved. This is an order of magnitude higher than that achieved by conventional copper-vapor lasers. The high electric field to number density ratio allows operation with high temperatures of up to 1800 C and high buffer gas pressures above atmospheric pressure. Keywords Transverse discharge, copper-vapor laser, Vapors, lasers.
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