E Beam: An Operating System for Particle Beam Lithography.

reportActive / Technical Report | Accession Number: ADA124563 | Open PDF

Abstract:

A modular suite of subroutines, designed to provide an operating environment for the RSRE Beam Lithography Machine EBLM-1 is described. The suite EBEAM will run on any PDP-11 16-bit minicomputer with sufficient memory under the RT11 or RSX-11M operating systems. Module names, peripheral addresses and instructions for installation and operation under both operating systems are given together with detailed descriptions of available commands and a list of error messages with possible causes and remedies. This memorandum is intended to be a general introduction and guide to users wishing to install and operate such a system. It does not give detailed descriptions of the individual modules and algorithms or of the hardware, as these are described elsewhere. Author

Author(s):
Merrifield, B. C.
Author Organization(s):
ROYAL SIGNALS AND RADAR ESTABLISHMENT MALVERN (ENGLAND)
Descriptive Note:
Memorandum rept.,
Pagination:
0030

Security Markings

DOCUMENT & CONTEXTUAL SUMMARY

Distribution:
Approved For Public Release

RECORD

Collection: TR
Identifying Numbers
Report Number(s):
RSRE-MEMO-3512, DRIC-BR-86524
Monitor Series:
BR-86524
 Subject Terms
Joint Capability Areas:
JCA_5_Command and Control; JCA_3_Force Application; JCA_5.5_Direct; JCA_5.5.1_Communicate Intent and Guidance; JCA_3.1.1_Maneuver to Engage; JCA_3.1_Maneuver; JCA_4.7.2_Installation Services; JCA_4.7_Base and Installations Support; JCA_6.1.3_Switching and Routing; JCA_3.2_Engagement; JCA_3.2.2_Non-Kinetic Means; JCA_6_Net Centric; JCA_6.1_Information Transport; JCA_5.5.2_Task; JCA_1.3_Human Capital Management; JCA_1_Force Support
Modernization Areas:
Microelectronics
Communities of Interest:
Advanced Electronics
Descriptor(s):
*COMPUTER PROGRAMS, *PROGRAMMING MANUALS, *LITHOGRAPHY, *PARTICLE BEAMS, DATA PROCESSING, PROGRAMMING LANGUAGES, FORTRAN, ELECTRON BEAMS, INPUT OUTPUT DEVICES, MAN COMPUTER INTERFACE, SUBROUTINES, MINICOMPUTERS, UNITED KINGDOM
Field(s)/Group(s):
Computer Programming and Software, Computer Hardware, Printing and Graphic Arts, Particle Accelerators
Keyword(s):
EBLM(Electron Beam Lithography Machine), EBEAM program
Report Date:
1982 Oct 01