Effect of Annealing Temperatures on TCR and Resistance Values for DC Sputtered Cr-Si Thin Film Resistors,

reportActive / Technical Report | Accession Number: ADA072937 | Open PDF

Abstract:

Thin film high value resistros composed of a silicon chromium mixture were sputter deposited under d.c. conditions in argon on to 99.6 as-fired alumina substrates. Reported are effects on TCR and resistor values which results from the variation of annealing temperatures. The resistors are for use in th fabrcation of hybrid microcircuiting intended for circuit applications whichinvolve ow power, low noise, digital and linear design requirements. Author

Author(s):
Morris, Hayden ; Rhodes, Henry
Author Organization(s):
NAVAL SURFACE WEAPONS CENTER WHITE OAK LAB SILVER SPRING MD
Pagination:
0025

Security Markings

DOCUMENT & CONTEXTUAL SUMMARY

Distribution:
Approved For Public Release

RECORD

Collection: TR
Identifying Numbers
Report Number(s):
NSWC/WOL/TR-78-54
Task Number(s):
S0266MW
Project Number(s):
S0266
 Subject Terms
Joint Capability Areas:
JCA_5_Command and Control; JCA_6.1.2_Wireless Transmission
Communities of Interest:
Advanced Electronics
Descriptor(s):
*ANNEALING, *SPUTTERING, *THIN FILM RESISTORS, TEMPERATURE, EXPERIMENTAL DATA, PROCESSING, EXPERIMENTAL DESIGN, THIN FILMS, FABRICATION, SUBSTRATES, DEPOSITION, ALUMINUM OXIDES, COEFFICIENTS, SILICON, TITANIUM, ELECTRICAL RESISTANCE, CHROMIUM, GOLD, ARGON, PALLADIUM, CERMETS, HYBRID CIRCUITS
Field(s)/Group(s):
Electrical and Electronic Equipment, Ceramics, Refractories and Glass, Fabrication Metallurgy
Keyword(s):
Resistance values, Sputter deposition, Cermet resistors, Alumina, WUU13CA, PE63601N
Report Date:
1978 Apr 11