IC Fabrication Using Electron-Beam Technology.

reportActive / Technical Report | Accession Number: ADA064770 | Open PDF

Abstract:

All of the required environmental and electrical tests of the first article 256-bit Bipolar RAM devices 50 were completed this quarter. These units passed all of the electrical measurements at 0 C, 25 C, and 70 C. However, the maximum operating speed of the units was about 20 slower than desired due to the electron resist being inadvertently removed during the contact oxide etch step. Fabrication of the pilot production units has begun and these units should pass all specifications including operating speed. Author

Author(s):
Varnell, Gilbert L. ; Chiang, Shang-yi ; Reynolds, Jack
Author Organization(s):
TEXAS INSTRUMENTS INC DALLAS
Descriptive Note:
Quarterly rept. no. 8, 1 Jun-1 Sep 78,
Pagination:
0035

Security Markings

DOCUMENT & CONTEXTUAL SUMMARY

Distribution:
Approved For Public Release

RECORD

Collection: TR
Identifying Numbers
Report Number(s):
TI-03-78-51, DELET-TR-76-8105-8
Contract/Grant Number(s):
DAAB07-76-C-8105
Monitor Series:
TR-76-8105-8
 Subject Terms
Joint Capability Areas:
JCA_5_Command and Control; JCA_5.2_Understand; JCA_6.1.3_Switching and Routing; JCA_6.1.2_Wireless Transmission; JCA_6.1_Information Transport; JCA_6_Net Centric; JCA_5.3_Planning; JCA_1.1_Force Management; JCA_1_Force Support; JCA_3.2_Engagement; JCA_3_Force Application; JCA_5.5.2_Task; JCA_5.5_Direct
Modernization Areas:
Space
Communities of Interest:
Advanced Electronics
Descriptor(s):
*INTEGRATED CIRCUITS, *RANDOM ACCESS COMPUTER STORAGE, *ELECTRON BEAMS, *BIPOLAR TRANSISTORS, PLASMAS(PHYSICS), ETCHING, REDUCTION, COSTS, OXIDES, SILICON, MONOLITHIC STRUCTURES(ELECTRONICS), FLUORIDES, PILOT PLANTS
Field(s)/Group(s):
Electrical and Electronic Equipment, Computer Hardware, Manufacturing and Industrial Engineering and Control of Production Systems
Keyword(s):
Operating speeds, Electron beam resists, Plasma etching, LPN DA 2769631
Report Date:
1979 Jan 01