IC Fabrication Using Electron-Beam Technology.

reportActive / Technical Report | Accession Number: ADA048307 | Open PDF

Abstract:

The technical and economic impact of electron-beam direct slice printing will be demonstrated on 256-bit bipolar RAMs. All electron-beam tapes necessary for fabricating the 256-bit bipolar RAMs have been generated. Advanced software techniques such as geometry sizing, sorting and incrementdecrement were used. E-beam processes have been developed for all lithographic steps on the 256-bit bipolar RAMs. Because of the pattern distortion at epitaxial growth, the original alignment marker system was modified. Several lots using this new alignment marker system are in process. The design of the Automatic Slice Loader is complete. Author

Author(s):
Varnell, Gilbert L. ; Williamson, Ronald A. ; Brewer, Terry L. ; Bartelt, John L. ; Robbins, Roger A.
Author Organization(s):
TEXAS INSTRUMENTS INC DALLAS
Descriptive Note:
Quarterly rept. no. 2, 1 Dec 76-1 Mar 77,
Pagination:
0036

Security Markings

DOCUMENT & CONTEXTUAL SUMMARY

Distribution:
Approved For Public Release

RECORD

Collection: TR
Identifying Numbers
Report Number(s):
TI-03-77-30
Contract/Grant Number(s):
DAAB07-76-C-8105
 Subject Terms
Joint Capability Areas:
JCA_7.2.1_Mitigate Lethal Effects; JCA_7.2_Mitigate; JCA_7_Protection; JCA_5_Command and Control; JCA_1_Force Support; JCA_5.5.2_Task; JCA_5.5_Direct
Modernization Areas:
Microelectronics
Communities of Interest:
No COI(s) Identified
Descriptor(s):
*FABRICATION, *INTEGRATED CIRCUITS, *ELECTRON BEAMS, EPITAXIAL GROWTH, ETCHING, RANDOM ACCESS COMPUTER STORAGE, ALIGNMENT, LITHOGRAPHY, SCHOTTKY BARRIER DEVICES, BIPOLAR SYSTEMS, METALLIZING
Field(s)/Group(s):
Electrical and Electronic Equipment, Manufacturing and Industrial Engineering and Control of Production Systems
Keyword(s):
LPN DA 2769631
Report Date:
1977 Jul 01