A Photolithographic Process to Produce Photomasks for Surface Wave Transducers.

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Abstract:

A process to produce photomask masters used in the production of surface wave transducers was developed and is described. Masters were to be clear pattern in achrome field on 7-mil glass with nominal 1.2 micrometer line and space widths with uniform electrode spacing in both apodized and unapodized patterns. Equipment limitations, processing techniques, and materials evaluated are discussed. Production of chrome masters on 60-mil glass was established. Consistent production on 7-mil glass requires additional development.

Author(s):
Lewis, Thomas H.
Author Organization(s):
ELECTROMASK INC WOODLAND HILLS CALIF
Descriptive Note:
Final rept. 2 Jan 73-31 Oct 74,
Pagination:
0025

Security Markings

DOCUMENT & CONTEXTUAL SUMMARY

Distribution:
Approved For Public Release

RECORD

Collection: TR
Identifying Numbers
Report Number(s):
AFCRL-TR-74-0575
Contract/Grant Number(s):
F19628-73-C-0151
Task Number(s):
563503
Project Number(s):
AF-5635
Monitor Series:
TR-74-0575
 Subject Terms
Communities of Interest:
No COI(s) Identified
Descriptor(s):
*TRANSDUCERS, *PHOTOLITHOGRAPHY, *PHOTOMASKING, SURFACE WAVES, ACOUSTIC WAVES
Field(s)/Group(s):
Line, Surface and Bulk Acoustic Wave Devices, Manufacturing and Industrial Engineering and Control of Production Systems
Keyword(s):
Acoustic surface waves
Report Date:
1974 Nov 13