MICROWAVE TRANSISTORS.

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Abstract:

This report describes advances in NPN planar-germanium transistor development for S and C band. Silicon nitride has been found to effectively mask both gallium and indium. Low-temperature sputtered films are being investigated. The Mo-Au contact system is now being used on the shallow-diffused germanium devices to reduce emitter base shorts resulting from use of aluminum expanded contacts. Detailed inductance measurements were made on the TI C-band and the miniature coaxial package. The double slide-screw transistor tester has been found to work very satisfactorily for noise and gain measurements up to 8 GHz. A new f sub t measuring set with operating frequency of 1 GHz has been constructed. A new method for noise characterization of microwave devices in terms of parameters invariant under lossless transformations has been developed. Breadboard work on the 1.7-2.4 GHz amplifier has been completed. Mask drawings for the S- and C-band oscillators and the S-band amplifier have been completed. Ceramic C-band balanced mixer NF performance shows 7.5 dB from 5.0 to 6.3 GHz. Characterization of the titanium dioxide substrate material has resulted in curves of Zo, loss, and slowing factor.

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