Photofabrication of Thin Films and Thin Film Stencils.

One of the purposes of this report is to provide a clear description of the principles of photofabrication as they apply to the accomplishment of precise, thin film configurations. In this regard, photofabrication techniques are used both to make the metal sheet stencils which define thin film patterns during deposition and to alter the pattern after deposition. In addition, equipment is described which was designed and built for specialized thin film and semiconductor investigations in the Electronic Research Laboratory. The equipment described will accommodate a one inch square resist pattern on a flat surface. Holding fixtures have been made for one inch square glass substrates and three inch square stainless steel shimstock. A considerable amount of commercial equipment is available but it is expensive and would be considerably more so if modified for our requirements. The step-by-step operating procedure is discussed in sufficient detail to facilitate the use of the equipment by a person initially unfamiliar with the processes. Author