VACUUM DEPOSITION OF THIN FILMS,

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Abstract:

The book deals with methods of obtaining and processing thin films, methods of measuring the deposition rate and thickness of thin-film layers, and the main fields of application of thin films. Vacuum requirements and the requirements for the composition of the residual medium in thermal evaporation and cathode sputtering are given, and modern methods of producing and measuring vacuums and the equipment used in obtaining thin films are described. Author

Author(s):
Danilin, B. S.
Author Organization(s):
FOREIGN TECHNOLOGY DIV WRIGHT-PATTERSON AFB OHIO
Supplementary Note:
Edited machine trans. of mono. Vakuumnee Nanesenie Tonkikh Plenok, Moscow, 1967, p1-312.
Annotation:
Vacuum deposition of thin films--Translation.
Pagination:
0334

Security Markings

DOCUMENT & CONTEXTUAL SUMMARY

Distribution:
Approved For Public Release

RECORD

Collection: TR
Identifying Numbers
Report Number(s):
FTD-MT-24-490-68
Project Number(s):
FTD-7230278
 Subject Terms
Communities of Interest:
Advanced Electronics
Descriptor(s):
(*VAPOR PLATING, VACUUM APPARATUS), (*FILMS, DEPOSITION), STATE OF THE ART REVIEWS, METAL FILMS, SEMICONDUCTING FILMS, DIELECTRIC FILMS, OPTICAL COATINGS, SPUTTERING, SPRAYS, VACUUM PUMPS, EVAPORATORS, THICKNESS, MANUFACTURING, INTEGRATED CIRCUITS, MICROELECTRONICS, THIN FILM STORAGE DEVICES, SUPERHIGH FREQUENCY, MASS SPECTROSCOPY, SPECTRUM ANALYZERS, USSR
Field(s)/Group(s):
Manufacturing and Industrial Engineering and Control of Production Systems
Keyword(s):
CATHODE SPUTTERING, PRESSURE MEASUREMENT, SPRAYERS, TRANSLATIONS, *VAPOR DEPOSITION
Report Date:
1969 Aug 15