AN R.F. SPUTTERING SYSTEM FOR USE IN MICROCIRCUIT FABRICATION,

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Abstract:

A simple diode R.F. sputtering system is described which has been used to sputter amorphous quartz for thin film capacitors. The problem of feeding R.F. power to the gas discharge in the sputtering chamber, and some factors affecting chamber impedance are discussed. Deposition rates of quartz up to 150 pms have been achieved, and the distribution of deposit is shown to be determined mainly by current density variation across the axis of the discharge. Author

Author(s):
Carver, I. G. ; Franklin, B. J.
Author Organization(s):
SIGNALS RESEARCH AND DEVELOPMENT ESTABLISHMENT CHRISTCHURCH (ENGLAND)
Pagination:
0023

Security Markings

DOCUMENT & CONTEXTUAL SUMMARY

Distribution:
Approved For Public Release

RECORD

Collection: TR
Identifying Numbers
Report Number(s):
SRDE-69018
 Subject Terms
Modernization Areas:
Microelectronics
Communities of Interest:
Advanced Electronics
Descriptor(s):
*INTEGRATED CIRCUITS, *SPUTTERING, QUARTZ, CAPACITORS, DIELECTRIC FILMS, RADIOFREQUENCY, UNITED KINGDOM
Field(s)/Group(s):
Electrical and Electronic Equipment, Manufacturing and Industrial Engineering and Control of Production Systems
Keyword(s):
THIN FILMS
Report Date:
1969 Mar 01