THIN FILM TECHNIQUES FOR SILICON INTEGRATED CIRCUITS.

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Abstract:

Resistance of electron beam evaporated cermet films was extended to 30,000 ohmssq. Using the 30 percent A12O3, 70 percent TaSi and Cr3Si powder, reproducibility of cermet deposition is being determined. Series of experiments on sputtered tantalum-silicon resistor films were initiated. Concentric circle 50-ohm resistors were fabricated for the ultrahigh frequency measurements experiments. Reactively sputtered Ta2O5 and SiN2 capacitors to 1.5 pfsq mil and 0.5 pfsq mil, respectively. 1000 hour 200C storage tests were completed on 100 IC892 resistor-transistor -capacitor units. IC772 circuit performance was reviewed using 200 ohmssq and 2500 ohmssq resistors. IC772 was redesigned to include coupling capacitor. Circular 50-ohm thin film resistor characteristics were measured up to 1000 MHz. Author

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