PROPERTIES OF TITANIUM AND RUTILE (TIO2) THIN FILMS.

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Abstract:

The structure of titanium films deposited in ultrahigh vacuum upon various substrates has been studied as a function of deposition conditions and substrate preparation. Films exhibiting structures ranging in refinement from random polycrystalline to single crystal alpha-titanium have been obtained. Rutile TiO2 films generated by thermal oxidation of the above exhibited various orientational developments, depending primarily upon the structure of the originals. These relationships and the various techniques employed are described herein. In addition, ultraviolet absorption spectra of the rutile films were obtained. Correlation between the structures of the oxide and the ultraviolet absorption spectra permitted the assignment of major features of the latter to the absorption of particular polarizations of light determined with respect to the axes of rutile. Author

Author(s):
Arntz, Floyd Olaf
Author Organization(s):
MASSACHUSETTS INST OF TECH CAMBRIDGE PHOTOCONDUCTIVE SEMICONDUCTORS AND DEVIC ES LAB
Descriptive Note:
Technical rept. Oct 64-Feb 66,
Pagination:
0033

Security Markings

DOCUMENT & CONTEXTUAL SUMMARY

Distribution:
Approved For Public Release

RECORD

Collection: TR
Identifying Numbers
Report Number(s):
AFML-TR-66-122
Contract/Grant Number(s):
AF 33(615)-2199
Task Number(s):
737101
Project Number(s):
AF-7371
Monitor Series:
TR-66-122
 Subject Terms
Joint Capability Areas:
JCA_6.3.3_Spectrum Management
Communities of Interest:
Advanced Electronics
Descriptor(s):
*METAL FILMS), (*RUTILE, FILMS), (*TITANIUM, VAPOR PLATING, SINGLE CRYSTALS, SUBSTRATES, OXIDATION, OXIDES, CRYSTAL STRUCTURE, ABSORPTION SPECTRA, ULTRAVIOLET RADIATION
Field(s)/Group(s):
Metallurgy and Metallography, Solid State Physics
Keyword(s):
THIN FILMS
Report Date:
1966 Mar 01