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Accession Number:
ADP007978
Title:
Laser Scatterometry for Process Characterization,
Corporate Author:
NEW MEXICO UNIV ALBUQUERQUE CENTER FOR HIGH TECHNOLOGY MATERIALS
Report Date:
1992-07-01
Abstract:
Laser scatterometry is a technique which involves shining a light beam on an area to be characterized and measuring the angular distribution of the light that is scattered from that area. A laser is used so that the incident light will be monochromatic and coherent. It is also valuable, in many applications, to be able to confine the probe beam to a selected area, with a diameter of 10 um or more. The scattered light distribution is typically measured either by scanning a detector over an arc, using a fixed array of photodiodes that are mounted along an arc, or by measuring the scattered light intensity distribution at a hemispherical screen when sample symmetry requires more than a one dimensional distribution measurement. In most cases, a single line measurement along a 90 deg arc is sufficient, either because of sample symmetry or because of the ability to align the sample in the direction of interest. The wavelength of the light used is a determining factor in the range of feature sizes that will be measured. Thus, different wavelength sources are sometimes valuable. Also, the angle of incidence of the probing light beam is a factor in the range of features that will be characterized.
Supplementary Note:
This article is from 'Advanced Processing and Characterization Technologies. Fabrication and Characterization of Semiconductor Optoelectronic Devices and Integrated Circuits Held in Clearwater, Florida on 8-10 May 1991. American Vacuum Society Series 10,'AD-A254 162, p54-55.
Pages:
0002
File Size:
0.00MB
