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Accession Number:
ADP007933
Title:
A Study of Structural Properties of Non-Stoichiometric Zinc Oxide Films Deposited by e-Beam Evaporation Technique,
Corporate Author:
NANJING UNIV (CHINA) DEPT OF PHYSICS
Report Date:
1992-05-22
Abstract:
Non-stoichiometric ZnOx 0.5xl films with different OZn composition ratios have been successfully deposited by e-beam evaporation technique under different conditions. Such zinc oxide films were analyzed using XPS method. X-ray diffraction was used to detect the crystallite orientation of ZnOx films with various temperatures of the substrates. The thicknesses of the films were measured by an interferential Microscope. Van der Pauw method was used to measure the electrical resistivity of the films. Zinc oxide films have been widely studied recently. As one of the functional films, they take much more advantages over other similar films. The 002 line for zinc oxide films is more stronger than every line observed for indium oxide films and some other films. Zinc oxide has extremely low vapor pressure, and zinc oxide films seem to be more stable than other similar films.
Supplementary Note:
This article is from 'Organization of the Optical Society of America Photonic Science Topical Meeting Series. Volume 3. The Microphysics of Surfaces: Beam-Induced Processes. Held in Santa Fe, New Mexico on 11-13 Feb 1991,' AD-A254 135,p142-145.
Pages:
0004
File Size:
0.00MB
