X-ray production at 130 A is measured from laser-produced plasmas using sub-Joule energies. Dependence of efficiency on target material and intensity are presented. Projection x-ray lithography systems require high brightness, narrow band sources in the soft x-ray region. Source requirements are set by the multilayer x-ray imaging optics and these typically have a bandpass of a few per cent below 200 eV. We have begun investigating laser-produced plasmas as a potential x-ray source for projection lithography. Although these are typically broadband sources they can be efficient radiators in the sub-kilovolt region. By proper choice of laser wavelength, pulse length, irradiation intensity, and target material, emission in the bandpass of interest can be optimized.
This article is from 'OSA Proceedings of the Topical Meeting on Soft-X-Ray Projection Lithography Held in Monterey, California on 10-12 April 1991. Volume 12', AD-A252 998, p68-71.