Considerations of the various issues relating to radiation sources for x-ray lithography are presented, focusing on two leading candidates-laser-produced plasma and synchrotron radiation sources. Issues to be addressed include power requirements of an x-ray source, deliverable power to wafer for both synchrotrons and laser plasma sources, and the requirement for collection solid angle and conversion efficiency for laser plasma sources. In our analysis, we attempt to bring out the relative merits of the sources and the advances necessary to make them viable for future x-ray lithographic systems.
This article is from 'OSA Proceedings of the Topical Meeting on Soft-X-Ray Projection Lithography Held in Monterey, California on 10-12 April 1991. Volume 12', AD-A252 998, p62-67.