Accession Number:

ADP007231

Title:

Design and Analysis of Multimirror Soft-X-Ray Projection Lithography Systems,

Personal Author(s):

Corporate Author:

ALABAMA UNIV IN BIRMINGHAM

Report Date:

1992-05-22

Abstract:

A differential equation method has been developed for the design of soft x-ray projection lithography systems. This method yields numerical values for the sag and slope of two surfaces within a multi-mirror projection system such that the Abbe Sine condition and the constant optical path length condition are satisfied. Application of this design method to three- and four-mirror systems is in progress. Results are compared to optical performance of similar systems designed by conventional methods.

Supplementary Note:

This article is from 'OSA Proceedings of the Topical Meeting on Soft-X-Ray Projection Lithography Held in Monterey, California on 10-12 April 1991. Volume 12', AD-A252 998, p22-26.

Pages:

0005

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File Size:

0.00MB

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