Accession Number:

ADA278416

Title:

Electrical Characteristics of GaAs MESFET Fabrication by Ion Implantation of Si or Se

Personal Author(s):

Corporate Author:

STANFORD UNIV CA DEPT OF ELECTRICAL ENGINEERING

Report Date:

1993-10-04

Abstract:

Since its synthesis in the 1920s by Goldschmidt, Gallium Arsenide has received much attention in the last few decades. In the mid-1980s, GaAs technology finally matured into the age of production. We saw a boom of companies dedicated to the growth of GaAs materials and the fabrication of GaAs devices and integrated circuits. Although GaAs is no longer being considered a general purpose material like silicon, it is now well established in several niche markets, such as Direct Broadcast Satellite, Microwave Monolithic Integrated Circuits and Optoelectronics.

Descriptive Note:

Final rept. 5 Jul 1989-4 Oct 1993

Pages:

0102

Communities Of Interest:

Distribution Statement:

Approved for public release; distribution is unlimited.

Contract Number:

F49620-89-C-0094

Contract Number 2:

ARPA ORDER-6860

File Size:

2.94MB