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Accession Number:
ADA278023
Title:
Induced Adsorption of Chloride and Bromide by Submonolayer Amounts of Copper Underpotentially Deposited on Pt(111)
Corporate Author:
CORNELL UNIV ITHACA NY DEPT OF CHEMISTRY
Report Date:
1994-03-14
Abstract:
The underpotential deposition of submonolayer amounts of copper induces an enhanced adsorption of chloride and bromide on Pt111 and is reflected in exceedingly sharp voltammetric peaks. The adsorbed anions are believed to be in contact with the platinum surface and in the vicinity of the electrodeposited copper. The electrosorption valency for chloride anions was estimated to be about one. This effect of induced adsorption was not observed on Pt100 pointing to the sensitivity of the process to the surface structure. The advantages of working with low concentrations of metals in UPD studies is illustrated.
Descriptive Note:
Technical rept.
Pages:
0043
Distribution Statement:
Approved for public release; distribution is unlimited.
Contract Number:
N00014-84-K-0656
File Size:
1.30MB
