Accession Number:

ADA063471

Title:

Reduction of Reticle Reflectance.

Personal Author(s):

Corporate Author:

NAVAL WEAPONS CENTER CHINA LAKE CALIF

Report Date:

1975-03-01

Abstract:

The objective of the effort reported here is to minimize the relative reflectance of reticles used in electro-optic guidance systems. Relative reflectance is defined as the ratio of observed reflectance of a surface to that of a perfectly smooth surface of the same material using near normal incident radiation. There are two mechanisms which can be utilized to reduce the relative reflectance scattering and absorption. The efforts described here were directed toward the development of a technique which emphasized the scattering mechanism. Scattering is dependent upon surface roughness, and in general one may state that the minimum RMS value of roughness to obtain less than 10 relative reflectance should be one-fifth the wavelength of the incident radiation. The objective is then narrowed to the problem of producing a sufficiently rough reticle pattern on a smooth transmitting substrate. Author

Descriptive Note:

Technical memo.,

Pages:

0013

Descriptors:

Identifiers:

Subject Categories:

Communities Of Interest:

Modernization Areas:

File Size:

5.33MB

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