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Accession Number:
ADA010440
Title:
Radiation and Charge Injection in A1203 Using New Techniques.
Corporate Author:
RCA LABS PRINCETON N J
Report Date:
1975-01-16
Abstract:
Vacuum ultraviolet VUV radiation studies of pyrolytic Al2O3 films have shown the threshold for electron-hole pair production to be approximately 7.8 eV. The voltage dependence of radiation-induced charging shows a sharp maximum with gate voltage applied during irradiation. This is interpreted as competition between electron-hole pair generation and high-field electron injection from the electrodes. Charge centroid measurements using constant-current photoinjection have shown that the initially injected charge is trapped very near the Si-Al2O3 interface. High-field electron injection experiments using a constant-current technique have shown that the injection threshold is markedly improved with 70 A or more of SiO2 between the Si and Al2O3, but this improvement is obtained at the expense of reduced radiation hardness.
Descriptive Note:
Interim rept. 17 Jun-16 Dec 74,
Pages:
0050
Contract Number:
F19628-74-C-0132
File Size:
0.00MB
