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Accession Number:
AD1043291
Title:
Fabrication of 3D Si based Photonic Crystal Structure with Single Self Aligned Etching Process
Corporate Author:
US Army Research Laboratory Adelphi United States
Report Date:
2010-09-01
Abstract:
We have designed and developed a simplified three-dimensional 3D photonic crystal PhC fabrication technique that can be used to fabricate a nanoscale 3D structure from the two-dimensional 2D surface of a silicon Si, or silicon on insulator SOI wafer with a single modified Bosch plasma etching process. Using this technique, we demonstrated such a PhC structure that includes hollow-core waveguides with high-contrast gratings as cladding. The etching process produces deep trenches with controlled width variation along the vertical direction. This method uses only a single mask such as e-beam lithography mask without alignment, and there is no need for deposition, regrowth, etc. This technique may greatly reduce the fabrication cost and increase the yield of 3D PhC devices.
Descriptive Note:
Technical Report
Pages:
0014
Distribution Statement:
Approved For Public Release;
File Size:
0.50MB
