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Accession Number:
AD0885549
Title:
An Improved Capability for Electron Beam Area Definition.
Corporate Author:
WESTINGHOUSE RESEARCH LABS PITTSBURGH PA
Report Date:
1971-03-01
Abstract:
The broad objective of this program was to improve certain aspects of the Electron Image Projection System for the production of high density integrated circuits. An automatic alignment system was developed to allow percise alignments of electron images of integrated circuit patterns to previously existing patterns on silicon wafers. Typical best performance involved accuracies to plus or minus 14 micron in times of 2 to 5 seconds. Factors affecting photocathode sensitivity and life-time were investigated leading to improvements in both aspects. A UV source containing cadmium was developed. Author
Descriptive Note:
Final rept. 3 Nov 69-2 Oct 70,
Pages:
0105
Contract Number:
N00019-70-C-0241
File Size:
0.00MB
