Accession Number:

AD0743656

Title:

Method for Cleaning Semiconductors Surfaces,

Personal Author(s):

Corporate Author:

FOREIGN TECHNOLOGY DIV WRIGHT-PATTERSON AFB OHIO

Report Date:

1972-04-04

Abstract:

The purpose of the invention is to elaborate the method of cleaning the surface of semiconductors in a hydrogen-containing protective atmosphere, which method could be applied as an independent process or conjointly with another process, e.g., fusion, vaporization, and which should make possible a considerably more effective cleaning of the surface of semiconductors.

Supplementary Note:

Unedited rough draft trans. of Patent (Poland) 59 500 p1-2 1970.

Pages:

0007

Descriptors:

Identifiers:

Subject Categories:

Communities Of Interest:

File Size:

0.00MB

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