An investigation was made of the properties of thin film evaporated thermoelectric materials. Layers of either n or p-type can be formed with electrical characteristics approaching those of bulk materials. Variations in the properties can be made through controlled evaporation rate and substrate temperature. X-ray studies of the deposited films have been undertaken as well as preliminary Hall measurements made on some films. Diffraction patterns both of bulk materials and films are highly complex and although certain correlations of electrical properties and structure have been observed, detailed interpretations of the patterns have not been possible up to this time. Annealing studies have shown that marked changes can be made in film properties principally in the direction of improvement.