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DEVELOPMENT OF OXIDATION RESISTANT HAFNIUM ALLOYS.
IIT RESEARCH INST CHICAGO IL
The objective of this program was the development of hafnium alloys that would be employed in oxidizing environments at temperatures of 2200 to 3000 F. Wide compositional ranges were investigated in the Hf-Ta and Hf-Cb systems with ternary additions. Emphasis has been on the study of oxidation resistance alloys developed to date are fabricable but, as expected, are weak at 2500 F. Interesting hafnium alloys have been defined that oxidize slowly in static air at 2500 F and below and are thermal shock-resistant. Compositions, such as Hf-25 wo Ta above 3 wo Cr or 1 wo or 1 wo Al, exhibit a weight gain of 1 mgsq cmhr in 100 hr at 2500 F. This exposure leads to a growth in the range of 6 to 10 mils per side which is associated with the formation of scale and subscale layers. Author
Final rept. 15 Jan 65-15 Apr 66.