Silicon Nanoclusters Embedded in SiO2 Studies by Raman Scattering
CENTRO DE INVESTIGACION YE DE ESTUDIOS AVANDOS DEL PIN QUERETARO (MEXICO) FACULTY OF ENGINEERING
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Low concentration of nanometric sized particles produced by a ball milling procedure were introduced into SiO2 matrix by the sol-gel method. SiO2 sol-gel formulations with high water-TEOS ratios were prepared. Samples with high silanol concentration was obtained for high temperatures as was proven by FTIR spectroscopy measurements. Raman scattering measurements showed evidence of a photo-oxidation effect of Si nanoparticles embedded into a SiO2 matrix. Si particle sizes measured by Raman scattering were in the range from 7 to 14 nm.
- Solid State Physics
- Manufacturing and Industrial Engineering and Control of Production Systems