Accession Number:

ADP013262

Title:

Silicon Nanoclusters Embedded in SiO2 Studies by Raman Scattering

Descriptive Note:

Conference proceedings

Corporate Author:

CENTRO DE INVESTIGACION YE DE ESTUDIOS AVANDOS DEL PIN QUERETARO (MEXICO) FACULTY OF ENGINEERING

Report Date:

2001-06-01

Pagination or Media Count:

4.0

Abstract:

Low concentration of nanometric sized particles produced by a ball milling procedure were introduced into SiO2 matrix by the sol-gel method. SiO2 sol-gel formulations with high water-TEOS ratios were prepared. Samples with high silanol concentration was obtained for high temperatures as was proven by FTIR spectroscopy measurements. Raman scattering measurements showed evidence of a photo-oxidation effect of Si nanoparticles embedded into a SiO2 matrix. Si particle sizes measured by Raman scattering were in the range from 7 to 14 nm.

Subject Categories:

  • Solid State Physics
  • Manufacturing and Industrial Engineering and Control of Production Systems

Distribution Statement:

APPROVED FOR PUBLIC RELEASE