Accession Number:

ADP011824

Title:

Nanoindentation/Nanoscratching and Stress Studies in Monolithic and Nanolayered Amorphous Carbon Films

Descriptive Note:

Conference proceedings

Corporate Author:

ARISTOTLE UNIV OF THESSALONIKI (GREECE)DEPT OF PHYSICS

Report Date:

2000-01-01

Pagination or Media Count:

12.0

Abstract:

We have recently reported that monolithic amorphous carbon a-C films deposited by RF magnetron sputtering exhibit a high level of spsup 3 sites when a negative bias voltage Vsub b is applied onto the substrate. This type of a-C films are dense 2.65 gcu cm, hard 20 GPa and highly stressed 6-7 GPa. The latter, however, limits their thickness below to 40 nm. Thus, we have developed nanolayer structured a-C thick films with alternating Vsub b positivenegative which are stable, hard and rich in spsup 3 content. Nanoindentation and low load scratch test results demonstrate that the layers rich in spsup 2 content promote the stress relaxation of the films during a compositional rearrangement when a layer rich in spsup 3 content is deposited. Possible explanations on the origin of the stress relaxation and the enhancement of the elastic properties in nanolayered a-C films are proposed and discussed based on the formation of compositional smooth interfaces between the two different types of layers.

Subject Categories:

  • Inorganic Chemistry
  • Fabrication Metallurgy

Distribution Statement:

APPROVED FOR PUBLIC RELEASE