Accession Number:

ADP011818

Title:

XRD Strain and Stress Determination in Nanostructured Films and Coatings

Descriptive Note:

Conference proceedings

Corporate Author:

RUTGERS - THE STATE UNIV PISCATAWAY NJ

Personal Author(s):

• Tsakalakos, Thomas
• Croft, Mark

Report Date:

2000-01-01

Pagination or Media Count:

8.0

Abstract:

The residual stress determination of nanostructured films and coatings is reviewed. A method of measuring the depth dependence of the stress profile using energy dispersive x-ray diffraction with a high-energy white beam synchrotron radiation source is presented. The profiling is accomplished with the aid of a highly collimated incident and scattered x-ray beams and with micro positioning of the sample-interface. The depth of the profiling is on the order of mm and the resolution of the profiling is on the order of a few microns. The technique allows the three dimensional profiling of the stress distribution in these materials.

Descriptors:

• *COATINGS
• *SYNCHROTRON RADIATION
• *NANOTECHNOLOGY
• *NANOSTRUCTURES
• SCATTERING
• MECHANICAL PROPERTIES
• SYMPOSIA
• THIN FILMS
• X RAY DIFFRACTION
• X RAYS
• RESIDUAL STRESS
• BEAMS(RADIATION)
• WORKSHOPS
• DISPERSIONS

Subject Categories:

• Coatings, Colorants and Finishes
• Optics
• Particle Accelerators

Distribution Statement:

APPROVED FOR PUBLIC RELEASE