Accession Number:

ADP007985

Title:

Mesoscopic Size Fabrication Technology,

Descriptive Note:

Corporate Author:

TOKYO UNIV (JAPAN)

Personal Author(s):

• Arakawa, Yasuhiko

Report Date:

1992-07-01

Pagination or Media Count:

4.0

Abstract:

Mesoscopic andor quantum microstructures have recently received great attentions, since new physical phenomena with possible applications to optical devices are expected in these structures. For this purpose, fabrication technologies including fractional layer superlattice growth, the laser assisted atomic layer epitaxy, and the facet wire growth are intensively investigated. In particular, use of both metal-organic chemical vapor deposition MOCVD selective growth technique and electron beam EB lithography technique would play important roles. In this paper, we discuss fabrication technologies for quantum wires and quantum boxes with emphasis on these electron-beam assisted MOCVD technologies. In addition, physics of the mesoscopic structures for laser applications is also discussed.

Descriptors:

• *FABRICATION
• *QUANTUM ELECTRONICS
• *SOLID STATE PHYSICS
• ADDITION
• BOXES
• CHEMICALS
• ELECTRON BEAMS
• LASER APPLICATIONS
• LASERS
• LAYERS
• LITHOGRAPHY
• METALS
• ORGANIC COMPOUNDS
• STRUCTURES
• SUPERLATTICES
• VAPOR DEPOSITION
• WIRE
• JAPAN
• ORGANOMETALLIC COMPOUNDS

Subject Categories:

• Solid State Physics
• Manufacturing and Industrial Engineering and Control of Production Systems

Distribution Statement:

APPROVED FOR PUBLIC RELEASE