Propagation of 100-GHz Bandwidth Electrical Pulses on a Silicon-Based Microstrip Line with Buried CoSi sub 2 Groundplane,
AT AND T BELL LABS HOLMDEL NJ
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We present a microstrip line that uses a highly conducting cobalt silicide layer buried 7 micron below the surface of single-crystalline silicon as groundplane. This novel transmission line shows significantly reduced dispersion for electrical pulses of 100 GHz bandwidth compared to a conventional microstrip line with the groundplane on the back of the substrate. The 2.5 ps risetime 10-90 of electrical pulses propagating on the line increases to only 3.7 ps after a distance of 5 mm compared to an increase from 2.7 ps to 11.3 ps on a conventional microstrip line.
- Electrical and Electronic Equipment
- Electrooptical and Optoelectronic Devices