Multilayers for Soft-X-Ray Optics,
TOHOKU UNIV SENDAI (JAPAN)
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Some problems fundamental to the design of soft-x-ray SXR multilayers are discussed. This includes an optical criterion for selecting proper material pairs and the critical film thickness needed for a film to become optically isotropic. A laboratory-type spectroreflectometer useful for the evaluation of SXR multilayers is presented with experimental results. For practical interest in SXR projection lithography, preliminary results are also presented on irradiation tests of SXR multilayers and design of a demagnifying Schwarzschild optics for use with synchrotron radiation.